Fukuoka, Japan

Akira Ootsuka

This inventor holds 1 USPTO granted patent. Top assignee: Krosakiharma Corporation. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Ootsuka. Retrieved from https://idiyas.com/inventor/akira-ootsuka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Akira Ootsuka: Innovator in Immersion Nozzle Technology

Introduction

Akira Ootsuka is a notable inventor based in Fukuoka, Japan. He has made significant contributions to the field of immersion nozzle technology, particularly in methods that enhance the efficiency and safety of molten steel replacement processes. His innovative approach has garnered attention in the industry.

Latest Patents

Ootsuka holds a patent for an "Immersion nozzle replacement method." This method addresses the challenges of replacing an immersion nozzle while minimizing the leakage of molten steel. By incorporating a shaped joint sealer and forming a concave portion on the new immersion nozzle's upper plane, Ootsuka's invention ensures high sealability during the replacement process.

Career Highlights

Ootsuka is currently employed at Krosakiharma Corporation, where he continues to develop and refine his innovative techniques. His work has been instrumental in advancing the technology used in steel manufacturing processes.

Collaborations

Ootsuka collaborates with talented colleagues, including Shinichi Fukunaga and Takahiro Kuroda, who contribute to the innovative environment at Krosakiharma Corporation.

Conclusion

Akira Ootsuka's contributions to immersion nozzle technology exemplify the impact of innovation in industrial processes. His patent reflects a commitment to improving safety and efficiency in steel manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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