Ibaraki, Japan

Akira Ohtani

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi Maxell, Limited. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Ohtani. Retrieved from https://idiyas.com/inventor/akira-ohtani-d6efwd72

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 1992

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Akira Ohtani: Innovator in Magnetic Recording Technology

Introduction

Akira Ohtani is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of magnetic recording technology. His innovative work has led to the development of a unique magnetic recording medium that enhances performance and efficiency.

Latest Patents

Ohtani holds a patent for a magnetic recording medium comprising a substrate coated with a primer. This medium features a non-magnetic substrate, a primer coating made of an organic conducting polymer, and a magnetic layer that provides excellent surface smoothness and low surface resistance. This invention is crucial for improving the quality of magnetic recordings.

Career Highlights

Ohtani is associated with Hitachi Maxell, Limited, where he has been instrumental in advancing magnetic recording technologies. His work has not only contributed to the company's reputation but has also impacted the industry as a whole.

Collaborations

Ohtani has worked alongside talented colleagues, including Akira Miyake and Tsugihiro Doi. Their collaborative efforts have fostered innovation and creativity within their projects.

Conclusion

Akira Ohtani's contributions to magnetic recording technology exemplify the spirit of innovation. His patent and work at Hitachi Maxell, Limited highlight his role as a key figure in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…