Tokyo, Japan

Akira Odagiri

This inventor holds 1 USPTO granted patent. Top assignee: Shincron Co., Ltd.. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Odagiri. Retrieved from https://idiyas.com/inventor/akira-odagiri

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Akira Odagiri: Innovator in Refractive Index Measurement

Introduction

Akira Odagiri is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of optical measurement, particularly in the area of refractive index measurement of thin films. His innovative approach has implications for various applications in optics and materials science.

Latest Patents

Odagiri holds a patent for a method of measuring the refractive index of thin films. This method involves forming a dielectric thin film on two substrates with different refractive indexes and measuring their reflectivities using light of an identical wavelength. The process allows for accurate determination of the refractive index of the dielectric thin film, which is crucial for various optical applications.

Career Highlights

Odagiri is associated with Shincron Co., Ltd., where he has been able to apply his expertise in optical measurement. His work has contributed to advancements in the field, enhancing the understanding and measurement of optical properties in materials.

Collaborations

Some of his coworkers include Shinichiro Saisho and Toshinobu Ikeda, who have collaborated with him on various projects related to optical measurement and thin film technology.

Conclusion

Akira Odagiri's contributions to the field of refractive index measurement demonstrate his innovative spirit and dedication to advancing optical science. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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