The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 1995
Filed:
Aug. 31, 1993
Shincron Co., Ltd., Tokyo, JP;
Abstract
A method of measuring the refractive index of a thin film is composed the steps of: (a) forming a dielectric thin film which is transparent, uniform and geometrically and optically identical, on each of a first substrate and a second substrate, with the refractive indexes of the first substrate and the second substrate being different; and (b) measuring the reflectivities of the first and second substrates, each bearing the dielectric thin film thereon, with the application of a light with an identical wavelength to the two substrates, thereby measuring the refractive index of the dielectric thin film. A refractive index measuring apparatus for conducting the above method is composed of a thickness measuring optical system for sequentially guiding a luminous flux emitted from a light source to a first monitor substrate and a second monitor substrate on both of which a dielectric thin film is to be formed, and then guiding two light rays respectively reflected by the first and second monitor substrates to a light receiving unit; and an arithmetic unit for calculating the refractive index of a dielectric thin film from two intensity signals from the light receiving unit.