Ome, Japan

Akira Kabashima

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 1984.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Kabashima. Retrieved from https://idiyas.com/inventor/akira-kabashima-2tb0bnsf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: Akira Kabashima: Innovator in Cleaning Technology

Introduction

Akira Kabashima is a notable inventor based in Ome, Japan. He has made significant contributions to the field of cleaning technology, particularly through his innovative patent that addresses the efficient cleaning of articles.

Latest Patents

Kabashima holds a patent for a "System for cleaning articles." This cleaning system is designed to remove foreign matters from the surfaces of various articles. The system features at least two treatment baths filled with respective cleaning liquids, with an intermediate bath located between adjacent treatment baths. The intermediate bath is filled with the cleaning liquid from one of the adjacent treatment baths, and this liquid is replaced with that from the other treatment bath. The articles are moved successively from the first to the last treatment bath while being continuously and completely immersed in the cleaning liquid.

Career Highlights

Kabashima is currently employed at Hitachi, Ltd., where he continues to develop innovative solutions in cleaning technology. His work has contributed to advancements in the efficiency and effectiveness of cleaning systems.

Collaborations

Some of his coworkers include Yosuke Inoue and Michiyoshi Maki, who collaborate with him on various projects within the company.

Conclusion

Akira Kabashima's contributions to cleaning technology through his innovative patent demonstrate his commitment to improving the efficiency of cleaning systems. His work at Hitachi, Ltd. continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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