This inventor holds 1 USPTO granted patent. Top assignee: Toyko Ohka Kogyo Co., Ltd.. Active years: 1991.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1991
Title: **Innovative Spirit: The Patents and Contributions of Akira Iwata**
Introduction
Akira Iwata, an innovative inventor based in Kanagawa, Japan, has made significant strides in the field of materials science with her unique contributions. With a focus on developing a heat-resistant photosensitive resin composition, she has showcased her expertise in creating advanced materials that have diverse applications in various industries.
Latest Patents
Iwata holds a patent for a heat-resistant photosensitive resin composition designed for various industrial applications. This composition incorporates several components: (a) a ternary copolymer made from an ethylenically unsaturated amide, a carboxyl-containing monomer, and a third monomer, (b) an esterified resin resulting from the reaction of an unsaturated carboxylic acid and a novolac-type epoxy resin, (c) a photopolymerizable monomer, (d) a photopolymerization initiator, and (e) a fine powder like silica filler. The resist layer formed from this composition can be developed with an alkaline aqueous solution. It exhibits excellent heat resistance and other desirable properties when subjected to thermal curing after patterned exposure to ultraviolet light.
Career Highlights
Iwata's career is highlighted by her work at Tokyo Ohka Kogyo Co., Ltd., where she collaborates with a team of accomplished professionals in the field. Her dedication to innovation has earned her recognition, and her contributions have paved the way for advancements in photosensitive materials.
Collaborations
Throughout her career, Akira Iwata has collaborated with esteemed colleagues, including Kenji Tazawa and Tomoki Horigome. These partnerships have not only fostered innovation but have also enriched the research environment, allowing for the sharing of ideas and expertise to drive technological advancements.
Conclusion
Akira Iwata stands out as a remarkable inventor whose work on heat-resistant photosensitive resins significantly impacts the materials science field. Her dedication and innovative spirit continue to inspire future developments, making her a vital contributor to the world of inventions and patents. As the demand for advanced materials grows, Iwata's contributions promise to play a crucial role in shaping the future of technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile