Kanagawa, Japan

Akira Iwata

This inventor holds 1 USPTO granted patent. Top assignee: Toyko Ohka Kogyo Co., Ltd.. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Iwata. Retrieved from https://idiyas.com/inventor/akira-iwata-8f3khksm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: **Innovative Spirit: The Patents and Contributions of Akira Iwata**

Introduction

Akira Iwata, an innovative inventor based in Kanagawa, Japan, has made significant strides in the field of materials science with her unique contributions. With a focus on developing a heat-resistant photosensitive resin composition, she has showcased her expertise in creating advanced materials that have diverse applications in various industries.

Latest Patents

Iwata holds a patent for a heat-resistant photosensitive resin composition designed for various industrial applications. This composition incorporates several components: (a) a ternary copolymer made from an ethylenically unsaturated amide, a carboxyl-containing monomer, and a third monomer, (b) an esterified resin resulting from the reaction of an unsaturated carboxylic acid and a novolac-type epoxy resin, (c) a photopolymerizable monomer, (d) a photopolymerization initiator, and (e) a fine powder like silica filler. The resist layer formed from this composition can be developed with an alkaline aqueous solution. It exhibits excellent heat resistance and other desirable properties when subjected to thermal curing after patterned exposure to ultraviolet light.

Career Highlights

Iwata's career is highlighted by her work at Tokyo Ohka Kogyo Co., Ltd., where she collaborates with a team of accomplished professionals in the field. Her dedication to innovation has earned her recognition, and her contributions have paved the way for advancements in photosensitive materials.

Collaborations

Throughout her career, Akira Iwata has collaborated with esteemed colleagues, including Kenji Tazawa and Tomoki Horigome. These partnerships have not only fostered innovation but have also enriched the research environment, allowing for the sharing of ideas and expertise to drive technological advancements.

Conclusion

Akira Iwata stands out as a remarkable inventor whose work on heat-resistant photosensitive resins significantly impacts the materials science field. Her dedication and innovative spirit continue to inspire future developments, making her a vital contributor to the world of inventions and patents. As the demand for advanced materials grows, Iwata's contributions promise to play a crucial role in shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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