Location History:
- Amagasaki, JP (1994)
- Kawabe-Gun, JP (1998)
Company Filing History:
Years Active: 1994-1998
Title: Innovations by Akira Ishii in Plasma Processing Technology
Introduction
Akira Ishii is a notable inventor based in Amagasaki, Japan, recognized for her significant contributions to plasma processing technology. With a total of two patents to her name, she has developed innovative solutions that enhance the efficiency and effectiveness of plasma processing apparatuses.
Latest Patents
Ishii's recent patents include the "Plasma processing apparatus for radiating microwave from rectangular" and the "Plasma processing apparatus for generating uniform strip-shaped plasma." In her first patent, she introduced a plasma processing apparatus equipped with a plasma chamber and a rectangular waveguide featuring long slots strategically positioned to optimize microwave radiation. This design allows for the emission of microwaves with enhanced precision through the narrow window of the plasma chamber.
Her second patent focuses on generating uniform strip-shaped plasma. This design employs a coupling rectangular waveguide with a strip-shaped rectangular slit, ensuring the effective transmission of microwaves into the plasma chamber via an airtight coupling member. This innovative setup is crucial for achieving uniform plasma characteristics essential to various industrial processes.
Career Highlights
Akira Ishii works at Daihen Corporation, a prominent company known for its advancements in automation and electrical engineering. Her work has positioned her as a key player in the field of plasma processing, underscoring her expertise and commitment to innovation. The impact of her inventions highlights her capability to address complex challenges in plasma technology.
Collaborations
Throughout her career, Ishii has collaborated with esteemed professionals, including Hiroyuki Yoshiki and Kazuki Kondo, contributing to a dynamic exchange of ideas that fosters innovation in their projects. These collaborations have further enriched her own understanding and application of plasma processing technologies.
Conclusion
Akira Ishii's inventive spirit and technical expertise continue to drive advancements in plasma processing technology. With her latest patents reflecting cutting-edge solutions, she is poised to make even greater contributions to the field. Her dedication and collaborative efforts underscore the importance of innovation in developing efficient manufacturing processes.