This inventor holds 2 USPTO granted patents. Top assignees: Dan Co., Ltd., Nec Machinery Corporation. Active years: 2002-2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002-2004
Title: Akira Ishii: Innovator in Measurement and Textile Technology
Introduction
Akira Ishii is a notable inventor based in Kusatsu, Japan. He has made significant contributions to the fields of measurement technology and textile processing. With a total of 2 patents, his work reflects a commitment to innovation and practical solutions.
Latest Patents
One of Ishii's latest patents is a method for measuring the height of spheres or hemispheres. This method provides a simple and inexpensive apparatus to measure the uniformity of the height-directional positions of bump electrodes in semiconductor devices. The process involves calculating the degree of focus from images acquired at two different focusing positions, allowing for the measurement of the height-directional positions of the bump electrodes.
Another significant patent is a process and apparatus for detecting loop stitches in tubular knitted fabric. This invention automates the detection of loop stitches by extending the fabric with a penetration element and capturing a multi-gradation image. The locations of the loop stitches are then detected through image processing, enhancing the efficiency of textile manufacturing.
Career Highlights
Throughout his career, Akira Ishii has worked with prominent companies such as NEC Machinery Corporation and Dan Co., Ltd. His experience in these organizations has contributed to his expertise in measurement and textile technologies.
Collaborations
Ishii has collaborated with notable coworkers, including Jun Mitsudo and Sadao Kawamura. Their collective efforts have further advanced the innovations in their respective fields.
Conclusion
Akira Ishii's contributions to measurement technology and textile processing demonstrate his innovative spirit and dedication to improving industry standards. His patents reflect a blend of creativity and practicality, making a lasting impact in his areas of expertise.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile