Kawasaki, Japan

Akio Yokofuke

This inventor holds 1 USPTO granted patent. Top assignee: Fujitsu Semiconductor Limited. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akio Yokofuke. Retrieved from https://idiyas.com/inventor/akio-yokofuke

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Akio Yokofuke: Innovator in Polishing Pad Technology

Introduction

Akio Yokofuke is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing through his innovative designs and methods. His work primarily focuses on enhancing the efficiency and effectiveness of polishing pads used in various applications.

Latest Patents

Yokofuke holds a patent for a polishing pad and a method for manufacturing it. The patent describes a polishing pad featuring first plural concave portions that are regularly allocated with prescribed spacing, along with a groove formed on its surface. Additionally, it includes a second concave portion that is randomly allocated, which does not correspond to the first plural concave portions or the groove on the surface of the polishing pad. This innovation aims to improve the polishing process in semiconductor manufacturing.

Career Highlights

Akio Yokofuke is currently employed at Fujitsu Semiconductor Limited, where he continues to develop and refine technologies that enhance semiconductor production. His expertise in polishing pad technology has positioned him as a key player in the industry.

Collaborations

Yokofuke has worked alongside talented colleagues, including Hiromasa Nagase and Hiroshi Misawa. Their collaborative efforts have contributed to advancements in semiconductor manufacturing processes.

Conclusion

Akio Yokofuke's innovative work in polishing pad technology exemplifies the importance of continuous improvement in semiconductor manufacturing. His contributions have the potential to significantly impact the efficiency of production processes in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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