Ishikawa, Japan

Akio Tani

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akio Tani. Retrieved from https://idiyas.com/inventor/akio-tani-zk9o6dfd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:

goldMedal1 out of 834,513 
Other
 patents

Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Akio Tani: Innovator in N-Oxyl Compounds

Introduction

Akio Tani is a notable inventor based in Ishikawa, Japan. He has made significant contributions to the field of chemistry, particularly in the development of N-oxyl compounds. His work has implications for various industrial applications, showcasing the importance of innovation in scientific research.

Latest Patents

Akio Tani holds a patent for "N-oxyl compounds, process for the preparation thereof, and process for inhibiting the polymerization of vinyl monomers with the same." This patent highlights his expertise in creating compounds that can be utilized in polymer chemistry, demonstrating his innovative approach to solving complex problems.

Career Highlights

Throughout his career, Akio Tani has focused on advancing chemical processes and materials. His dedication to research and development has led to the successful patenting of his work, which is a testament to his skills as an inventor.

Collaborations

He has collaborated with notable colleagues, including Junichi Doi and Hiroshi Sonobe. These partnerships have likely contributed to the success of his projects and the advancement of their shared research goals.

Conclusion

Akio Tani's contributions to the field of chemistry through his patent on N-oxyl compounds exemplify the impact of innovative thinking in science. His work continues to inspire future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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