Toyohashi, Japan

Akio Oota

This inventor holds 2 USPTO granted patents. Top assignee: Murata Manufacturing Co., Ltd.. Active years: 2000-2002.


% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2000-2002

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2 patents (USPTO):Explore Patents

Title: Akio Oota: Innovator in Dielectric Technology

Introduction

Akio Oota is a prominent inventor based in Toyohashi, Japan. He has made significant contributions to the field of dielectric technology, holding a total of 2 patents. His work focuses on developing advanced materials and devices that enhance communication technologies.

Latest Patents

Oota's latest patents include innovations such as a dielectric resonator, dielectric filter, dielectric duplexer, and a communications device featuring specific dielectric and superconductive compositions. One of his notable inventions is a compact dielectric resonator with high quality factor (Qu). This resonator incorporates an electrode made from an oxide superconducting material, which is strategically placed on the dielectric surface. Additionally, his patents detail a method for producing superconducting thick films, which involves several steps including forming a thick layer of superconducting material on a substrate and subjecting it to cold isostatic pressing.

Career Highlights

Akio Oota is associated with Murata Manufacturing Co., Ltd., a leading company in the electronics industry. His work at Murata has allowed him to push the boundaries of dielectric materials and their applications in modern communication devices.

Collaborations

Oota has collaborated with notable coworkers such as Tsutomu Tatekawa and Yuji Kintaka. Their combined expertise has contributed to the advancement of dielectric technology and its practical applications.

Conclusion

Akio Oota's innovative work in dielectric technology has positioned him as a key figure in the field. His patents reflect a commitment to enhancing communication devices through advanced materials and methods.

Profile summary based on public USPTO records.
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