Akio Kawamura

Title: The Innovative Contributions of Akio Kawamura

Introduction

Akio Kawamura is a notable inventor based in Sapporo, Japan. He has made significant contributions to the field of plasma filtration, holding a total of four patents. His work focuses on improving the efficiency and effectiveness of plasma filtering processes.

Latest Patents

Among his latest patents is a method for washing secondary filters in the process of filtering plasma. This invention addresses the challenge of separating blood into blood cells and plasma using a primary filter. The secondary filter is designed to remove harmful macromolecules from the plasma. Kawamura's innovative approach minimizes the loss of plasma discarded from the system by reducing the plugging of the secondary filter. This is achieved by opening an inner chamber of the secondary filter to the atmosphere, thereby lowering the internal pressure whenever an increase in pressure is detected due to plugging tendencies. The washing process of the secondary filter is conducted from both the inner and outer chamber sides after the internal pressure has been reduced.

Career Highlights

Throughout his career, Akio Kawamura has worked with prominent companies such as Otsuka Pharmaceutical Factory, Inc. and Hoxan Corporation. His experience in these organizations has contributed to his expertise in the field of plasma filtration and medical technology.

Collaborations

Kawamura has collaborated with several professionals in his field, including Motoki Yonekawa and Hiroshi Kamogawa. These collaborations have likely enhanced his research and development efforts, leading to innovative solutions in plasma filtration.

Conclusion

Akio Kawamura's contributions to plasma filtration technology demonstrate his commitment to innovation and improvement in medical processes. His patents reflect a deep understanding of the challenges in this field and offer practical solutions to enhance efficiency.