Sapporo, Japan

Akio Kawakura

This inventor holds 1 USPTO granted patent. Top assignee: Otsuka Pharmaceutical Factory, Inc.. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akio Kawakura. Retrieved from https://idiyas.com/inventor/akio-kawakura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Akio Kawakura: Innovator in Plasma Filtering Technology

Introduction

Akio Kawakura is a notable inventor based in Sapporo, Japan. He has made significant contributions to the field of plasma filtering technology. His innovative approach has led to the development of a unique process that enhances the efficiency of plasma filtration.

Latest Patents

Kawakura holds a patent for a "Process for filtering plasma and regenerating a secondary filter therefor." This invention showcases his expertise in creating solutions that improve existing technologies. He has 1 patent to his name, reflecting his commitment to innovation.

Career Highlights

Kawakura is currently employed at Otsuka Pharmaceutical Factory, Inc. His work at this esteemed company has allowed him to focus on advancements in pharmaceutical technologies. His contributions have been instrumental in enhancing the company's research and development efforts.

Collaborations

Throughout his career, Kawakura has collaborated with talented individuals such as Motoki Yonekawa and Hiroshi Kamogawa. These partnerships have fostered a creative environment that encourages the exchange of ideas and innovation.

Conclusion

Akio Kawakura is a distinguished inventor whose work in plasma filtering technology has made a significant impact. His dedication to innovation and collaboration continues to drive advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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