Hino, Japan

Akio Ichimura

This inventor holds 1 USPTO granted patent. Top assignee: Fanuc Corporation. Active years: 1985.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akio Ichimura. Retrieved from https://idiyas.com/inventor/akio-ichimura-lf4ugvz8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1985

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1 patent (USPTO):Explore Patents

Title: Akio Ichimura: Innovator in Measurement Technology

Introduction

Akio Ichimura is a notable inventor based in Hino, Japan. He has made significant contributions to the field of measurement technology, particularly through his innovative patent. His work is recognized within the industry, and he is associated with a leading company in automation.

Latest Patents

Ichimura holds a patent for a "Measurement method by numerical control device." This invention showcases his expertise in enhancing measurement techniques, which are crucial for precision in various applications.

Career Highlights

Ichimura is currently employed at Fanuc Corporation, a prominent player in the automation and robotics sector. His role at Fanuc allows him to apply his inventive skills in a practical environment, contributing to the company's reputation for innovation.

Collaborations

Ichimura has worked alongside talented colleagues such as Ryoichiro Nozawa and Nobuyuki Kiya. Their collaborative efforts have likely fostered an environment of creativity and innovation within their projects.

Conclusion

Akio Ichimura's contributions to measurement technology through his patent and work at Fanuc Corporation highlight his role as an influential inventor in the field. His innovative spirit continues to drive advancements in automation and measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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