This inventor holds 1 USPTO granted patent. Top assignee: Central Glass Company, Limited. Active years: 1989.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1989
Title: Akimasa Hattori: Innovator in Metal Compound Film Technology
Introduction
Akimasa Hattori is a notable inventor based in Matsusaka, Japan. He has made significant contributions to the field of material science, particularly in the development of methods for forming patterned films on substrate surfaces.
Latest Patents
Hattori holds a patent for a method of forming a patterned film on a substrate surface using metal. This invention relates to a sol-gel method for creating a patterned film of metal compounds such as TiO₂, SiO₂, ZrO₂, Al₂O₃, TiN, or Si₃N₄. The process involves applying a metal alkoxide sol to a substrate, allowing it to turn into a gel film through hydrolysis, and then selectively etching away the gel film in unnecessary areas. The remaining gel film is baked to achieve the desired pattern.
Career Highlights
Hattori is currently employed at Central Glass Company, Limited, where he continues to innovate in the field of material applications. His work has been instrumental in advancing technologies that utilize metal compounds in various industries.
Collaborations
Hattori has collaborated with notable coworkers, including Kensuke Makita and Katsuto Tanaka, contributing to the development of innovative solutions in their field.
Conclusion
Akimasa Hattori's contributions to the field of patterned film technology highlight his role as a significant inventor. His patented methods demonstrate the potential for advancements in material science and their applications in various industries.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile