The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 1989
Filed:
Dec. 08, 1988
Central Glass Company, Limited, Ube, JP;
Abstract
The invention relates to a sol-gel method for forming a patterned film of a metal compound, e.g. TiO.sub.2, SiO.sub.2, ZrO.sub.2, Al.sub.2 O.sub.3, TiN or Si.sub.3 N.sub.4, on a substrate by applying a metal alkoxide sol to the substrate, allowing the sol film on the substrate to turn into a gel film by hydrolysis, removing the gel film in the unnecessary area(s) by selective etching and baking the gel film in the remaining aarea(s). The selective etching of the gel film is easily accomplished by the steps of moistening the gel film in the unnecessary area(s) with a viscous liquid containing, e.g., an organic solvent or an organic acid, hardening the gel film in the remaining area(s) by mild heating, and then removing the gel film in the unnecessary area(s) by washing with a suitable liquid such as an alkali solution or, when said viscous solution contains an organic acid and water, water.