Kyoto, Japan

Akiko Tanaka


Average Co-Inventor Count = 3.8

ph-index = 3

Forward Citations = 54(Granted Patents)


Company Filing History:


Years Active: 1999-2004

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3 patents (USPTO):Explore Patents

Title: Akiko Tanaka: Innovator in Substrate Processing Technology

Introduction

Akiko Tanaka is a renowned inventor based in Kyoto, Japan, recognized for her innovative contributions to substrate processing technology. With a total of three patents to her name, her groundbreaking work is significantly impacting the manufacturing processes in the semiconductor and electronics industries.

Latest Patents

Among her latest patents is the "Substrate Processing Apparatus," which enhances the efficiency of developing processes on substrates. This invention involves a rinse discharge nozzle that provides a continuous supply of pure water onto the substrate while simultaneously recovering the rinse water. The system allows for a development process that maintains the substrate in a stationary state, thereby optimizing the quality of the output.

Another notable patent is the "Method of and Apparatus for Supplying Developing Solution onto Substrate." This innovative device features a developing solution dispensing nozzle that scans the substrate while uniformly dispensing the developing solution. The nozzle is designed with variable scanning speeds, which ensures a constant flow rate of the developing solution, resulting in enhanced uniformity in application.

Career Highlights

Akiko is employed at Dainippon Screen Mfg. Co., Ltd., a leading company in the field of semiconductor manufacturing equipment. Her inventions are a testament to her expertise and dedication in advancing technological processes that are critical for the production of electronic components.

Collaborations

Throughout her career, Akiko has collaborated with other talented individuals in her field, including her colleagues Masahiro Mimasaka and Masakazu Sanada. These collaborative efforts have fostered an environment of innovation that contributes to the success of their projects and the company as a whole.

Conclusion

Akiko Tanaka's contributions through her innovative patents have established her as a prominent figure in the field of substrate processing. Her commitment to advancing technology continues to inspire new generations of inventors and technicians in the industry.

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