Dainippon Screen Mfg. Co., Ltd.

Akiko Tanaka

Masahiro Mimasaka

Masahiko Harumoto

Masakazu Sanada

Minobu Matsunaga

Osamu Tamada

Yukihiro Takamura

Koji Uchitani

Kayoko Nakano

A developer is supplied onto a substrate and thereafter a rinse discharge nozzle is moved toward an operating direction. The rinse discharge nozzle is so moved on the substrate as to continuously supply pure water onto the substrate from a slit discharge port of the rinse discharge nozzle while sucking and recovering the pure water from the surface of the substrate through a slit suction port, and a series of development is performed in a stationary state of the substrate.

Substrate processing apparatus

A developing solution dispensing nozzle starts scanning at a scanning start position P1. After the developing solution dispensing nozzle reaches an edge of a substrate, the developing solution dispensing nozzle scans over the substrate while uniformly dispensing a developing solution to a surface of the substrate. The developing solution dispensing nozzle thereafter moves off the substrate from the other edge of the substrate. To uniformly supply the developing solution to a substrate, where a flow rate of the developing solution is set constant, a scanning speed is set large during an initial scanning section over a substrate, and the scanning speed is set slow during the remaining section. Meanwhile, where the scanning speed of the developing solution dispensing nozzle is set constant, the flow rate of the developing solution is gradually increased during the initial scanning section, and the flow rate is set constant during the remaining section.

Method of and apparatus for supplying developing solution onto substrate

A developing apparatus in which a substrate holding part holds a substrate in a stationary state, and a developer discharge nozzle starts scanning from a scanning start position. After scanning starts, the developer discharge nozzle discharges a developer at a discharge start position before a slit discharge port thereof reaches the substrate. The developer discharge nozzle moves linearly on the substrate in a scanning direction while discharging the developer, passes over the substrate, and thereafter stops discharging the developer at a discharge stop position separated from the substrate. The developer discharge nozzle stops scanning when reaching a scanning stop position.

Developing apparatus and developing method

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Kyoto, Japan

Akiko Tanaka