Company Filing History:
Years Active: 2018-2019
Title: Akiko Miyamoto: Innovator in Polishing Technologies
Introduction
Akiko Miyamoto is a prominent inventor based in Kyoto, Japan. She has made significant contributions to the field of polishing technologies, particularly in the semiconductor industry. With a total of three patents to her name, her work has garnered attention for its innovative approaches and practical applications.
Latest Patents
Miyamoto's latest patents include a polishing composition and a method for polishing semiconductor substrates. The polishing composition she proposed includes hydroxyethyl cellulose, water, and abrasive grains. Notably, the hydroxyethyl cellulose has a molecular weight ranging from 500,000 to 1,500,000, with a specific proportion of 30% to 90% adsorbed to the abrasive grains. Additionally, her method for polishing semiconductor substrates involves an intermediate polishing step that ensures at least 45% of surface defects are less than 3 nm in height, followed by a final polishing step for optimal results.
Career Highlights
Miyamoto has established herself as a key figure in her field through her innovative research and development efforts. Her work at Nitta Haas Inc. has allowed her to apply her inventions in practical settings, contributing to advancements in semiconductor manufacturing processes.
Collaborations
Some of her notable coworkers include Masashi Teramoto and Tatsuya Nakauchi. Their collaborative efforts have further enhanced the impact of her inventions in the industry.
Conclusion
Akiko Miyamoto's contributions to polishing technologies reflect her dedication to innovation and excellence. Her patents not only advance the field but also demonstrate her commitment to improving semiconductor manufacturing processes.