Nagoya, Japan

Akihito Iida

This inventor holds 1 USPTO granted patent. Top assignee: Toagosei Chemical Industry, Co., Ltd.. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akihito Iida. Retrieved from https://idiyas.com/inventor/akihito-iida-wdk3m2pa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Akihito Iida: Innovator in Fluorine-Containing Copolymers

Introduction

Akihito Iida is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of materials science, particularly in the development of fluorine-containing copolymers. His work has implications for various applications, including coatings and other industrial uses.

Latest Patents

Iida holds a patent for a fluorine-containing copolymer and coating composition. This invention provides a unique copolymer that comprises essential monomers, enhancing the performance and durability of coatings. His innovative approach in this area has garnered attention for its potential applications in various industries.

Career Highlights

Iida is associated with Toagosei Chemical Industry, Co., Ltd., a company known for its advancements in chemical manufacturing. His role in the company has allowed him to focus on research and development, leading to his successful patent. With 1 patent to his name, Iida has established himself as a key figure in his field.

Collaborations

Iida has worked alongside talented colleagues, including Masanobu Koyama and Etsuzo Marumoto. Their collaborative efforts have contributed to the innovative projects at Toagosei Chemical Industry, Co., Ltd.

Conclusion

Akihito Iida's contributions to the field of fluorine-containing copolymers highlight his innovative spirit and dedication to advancing materials science. His work continues to influence the industry and pave the way for future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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