Toyama, Japan

Akihiro Yoshida

USPTO Granted Patents = 4 

Average Co-Inventor Count = 2.2

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2010-2013

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4 patents (USPTO):Explore Patents

Title: Akihiro Yoshida: Innovator in Substrate Treatment Technology

Introduction

Akihiro Yoshida is a prominent inventor based in Toyama, Japan. He has made significant contributions to the field of substrate treatment technology, holding a total of four patents. His work focuses on improving the efficiency and automation of substrate handling processes in semiconductor manufacturing.

Latest Patents

Yoshida's latest patents include innovative equipment and methods aimed at enhancing substrate treatment. One of his notable inventions is a substrate treatment equipment that can automatically collect substrates in a normal condition without requiring manual operation. This equipment features a substrate holder designed to hold substrates in a multistage manner and a substrate transfer unit that facilitates the transfer of substrates into the holder. The system incorporates a sensing section equipped with photo-sensors to monitor the substrate holding condition. The sensing waveforms detected by the photo-sensors are compared with a normal waveform to ensure proper operation. A control section is also included, which manages the substrate transfer unit to ensure that only substrates deemed normal are transferred.

Another significant patent by Yoshida is a method for manufacturing semiconductor devices. This invention shares similar principles with his substrate treatment equipment, focusing on automating the collection and handling of substrates to improve efficiency and reduce the need for manual intervention.

Career Highlights

Yoshida is currently employed at Hitachi Kokusai Electric Inc., where he continues to develop innovative solutions in the semiconductor industry. His work has been instrumental in advancing substrate treatment technologies, contributing to the overall efficiency of semiconductor manufacturing processes.

Collaborations

Throughout his career, Yoshida has collaborated with notable colleagues, including Makoto Hirano and Norichika Yamagishi. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Akihiro Yoshida's contributions to substrate treatment technology have made a significant impact on the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in automation and efficiency.

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