Osaka, Japan

Akihiro Yamazaki

USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.5

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: Akihiro Yamazaki: Innovator in Barrier Films and Adhesive Technologies

Introduction

Akihiro Yamazaki is a prominent inventor based in Osaka, Japan. He has made significant contributions to the fields of barrier films and pressure-sensitive adhesive technologies. With a total of 2 patents to his name, his work has had a notable impact on various industries.

Latest Patents

Yamazaki's latest patents include innovative products such as a barrier film and a pressure-sensitive adhesive (PSA) sheet for surface protection. The barrier film features a gas barrier film with a primer layer that enhances its performance. This primer layer is created using a specific composition that includes a resin with a reactive carbon-carbon double bond, a resin with a primary hydroxyl group, and a polyisocyanate compound. The primer layer achieves a surface wetting index of 40 dyn/cm or more, making it highly effective. The pressure-sensitive adhesive sheet is designed to reduce adherend damage while maintaining appearance, featuring a multilayer structure that includes a surface layer, a resin substrate layer, and a PSA layer.

Career Highlights

Throughout his career, Akihiro Yamazaki has worked with notable companies such as Arakawa Chemical Industries, Ltd. and Nitto Denko Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in material science and adhesive technologies.

Collaborations

Yamazaki has collaborated with talented individuals in his field, including Toru Higashimoto and Keita Kume. These partnerships have contributed to the advancement of his projects and the successful development of his patents.

Conclusion

Akihiro Yamazaki is a distinguished inventor whose work in barrier films and adhesive technologies has made a significant impact. His innovative patents and collaborations highlight his dedication to advancing material science.

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