This inventor holds 1 USPTO granted patent. Top assignee: Kurashiki Boseki Kabushiki Kaisha. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Akihiro Ueno: Innovator in Hydroxyl Radical Technology
Introduction
Akihiro Ueno is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of water treatment technology, particularly through his innovative methods for supplying hydroxyl radical-containing water. His work is characterized by a focus on convenience and efficiency in water supply systems.
Latest Patents
Ueno holds a patent for a "Method for supplying hydroxyl radical-containing water and apparatus for supplying hydroxyl radical-containing water." This patent discloses a method that allows for the production of water containing a relatively high concentration of hydroxyl radicals. The process involves dissolving ozone, hydrogen peroxide, and various additive substances in pure water. The method includes steps for producing, transferring, and supplying this specialized water to the point of use.
Career Highlights
Throughout his career, Ueno has demonstrated a commitment to advancing water treatment technologies. His innovative approach has led to the development of practical solutions that enhance the quality and accessibility of hydroxyl radical-containing water. Ueno's work is recognized for its potential applications in various industries, including healthcare and environmental management.
Collaborations
Ueno has collaborated with notable colleagues such as Tadaharu Tanaka and Motonobu Shiomi. These partnerships have contributed to the refinement and implementation of his innovative technologies.
Conclusion
Akihiro Ueno's contributions to hydroxyl radical technology exemplify the impact of innovation in water treatment. His patented methods offer promising solutions for enhancing water quality and accessibility.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
