Akihiro Ochi

Title: Akihiro Ochi: Innovator in Ion Implantation Technology

Introduction

Akihiro Ochi is a prominent inventor based in Tokyo, Japan, known for his significant contributions to the field of ion implantation technology. With a total of 10 patents to his name, Ochi has made remarkable advancements that enhance the efficiency and precision of ion implantation processes.

Latest Patents

Ochi's latest patents include an innovative ion implantation apparatus and method. The ion implantation apparatus features a beam scanner that provides a reciprocating beam scan in accordance with a scan waveform. It also includes a mechanical scanner that allows a wafer to reciprocate in a mechanical scan direction. A control device is integrated to manage both the beam scanner and the mechanical scanner, ensuring a target two-dimensional dose amount distribution on the wafer's surface. The control device comprises a scan frequency adjusting unit that determines the frequency of the scan waveform based on the target distribution, along with a beam scanner driving unit that operates the beam scanner using the adjusted scan waveform.

Another notable patent is an ion implantation apparatus that performs multiple ion implantation processes with varying conditions on the same wafer. This apparatus is designed to ensure that the twist angles of the wafer differ during the processes. It also allows for the ion beam to be directed at a wafer surface that moves in a reciprocating direction, with the target value of the beam current density distribution being adjustable according to the wafer's position.

Career Highlights

Throughout his career, Akihiro Ochi has worked with esteemed companies such as Sen Corporation and Sumitomo Heavy Industries Ion Technology Co., Ltd. His experience in these organizations has contributed to his expertise in ion implantation technology and has facilitated the development of his innovative patents.

Collaborations

Ochi has collaborated with notable professionals in the field, including Shiro Ninomiya and Yasuharu Okamoto. These collaborations have likely enriched his work and led to further advancements in ion implantation technology.

Conclusion

Akihiro Ochi's contributions to ion implantation technology through his patents and collaborations highlight his role as a leading inventor in this specialized field. His innovative approaches continue to influence the industry and pave the way for future advancements.