Kyoto, Japan

Akihiro Nakashima

This inventor holds 3 USPTO granted patents and 3 published patent applications. Top assignee: Screen Holdings Co., Ltd.. Active years: 2017-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akihiro Nakashima. Retrieved from https://idiyas.com/inventor/akihiro-nakashima-tsw10wit

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2017-2023

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3 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Akihiro Nakashima in Substrate Processing**

Introduction

Akihiro Nakashima is an accomplished inventor based in Kyoto, Japan, known for his significant contributions to the field of substrate processing. With a total of three patents to his name, Nakashima has made advancements that enhance the efficiency and effectiveness of substrate processing in various applications.

Latest Patents

His latest patents focus on innovative methods and apparatuses for substrate processing. One of his notable inventions is a substrate processing apparatus that incorporates a temperature detector and a controller. This apparatus enables the detection of the processing liquid's temperature before it reaches a target temperature during pre-dispensing. The controller plays a crucial role in setting the discharge stop duration of the processing liquid based on predictions for how long it will take to reach the target temperature. The system relies on historical temperature profiles to ensure accurate temperature management.

Another significant patent features a substrate processing apparatus where a supply flow passage is branched into several upstream flow passages. This design includes multiple discharge ports positioned at varying distances from the substrate's rotational axis. A mixing ratio changing unit, equipped with several flow control valves, allows for independent adjustments of chemical mixtures, specifically sulfuric acid and hydrogen peroxide water, enabling highly customizable chemical processing.

Career Highlights

Nakashima's work is integral to Screen Holdings Co., Ltd., where he continues to innovate within the realm of substrate processing technologies. His focus on improving temperature detection and liquid processing methods aims to streamline production processes and enhance product quality in semiconductor manufacturing and other related fields.

Collaborations

In his career, Nakashima has collaborated with esteemed colleagues such as Kenji Kobayashi and Jun Sawashima. Together, they have contributed to the advancement of substrate processing methodologies, further enhancing the capabilities of the processing apparatus developed at their company.

Conclusion

Akihiro Nakashima stands out as a prominent inventor whose patents and innovative designs are poised to make a lasting impact in the field of substrate processing. His collaborations and ongoing work at Screen Holdings Co., Ltd. exemplify a commitment to advancing technology and enhancing manufacturing efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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