Chiba, Japan

Akihiro Ezoe

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Jnc Corporation. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akihiro Ezoe. Retrieved from https://idiyas.com/inventor/akihiro-ezoe-da4yvl0n

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Akihiro Ezoe: Innovator in Coating Technologies

Introduction

Akihiro Ezoe is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of coating technologies, particularly with his innovative approach to creating effective coating films. His work focuses on enhancing water repellency and antifouling properties in various applications.

Latest Patents

Ezoe holds a patent for a coating liquid and article using the same. The patent addresses the problem of providing a coating film that maintains good water repellency and antifouling properties. The solution involves a photopolymerizable coating composition that includes a urethane (meth)acrylate and a photopolymerizable (meth)acrylic compound. The composition is designed to mix specific percentages of these components to achieve optimal performance.

Career Highlights

Ezoe is currently associated with JNC Corporation, where he continues to develop innovative solutions in coating technologies. His expertise in photopolymerizable compositions has positioned him as a key figure in the industry.

Collaborations

Ezoe collaborates with Kyoko Kondo, contributing to advancements in their field through shared knowledge and expertise.

Conclusion

Akihiro Ezoe's work in coating technologies exemplifies innovation and dedication to improving material properties. His contributions are valuable to the industry and highlight the importance of research and development in creating effective solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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