Akihiko Otoguro

Title: Akihiko Otoguro and Semiconductor Patterning Innovations.

Introduction

Akihiko Otoguro is an inventor associated with semiconductor manufacturing technologies and Fujitsu Corporation. His patent work addresses multilayer resist structures and methods for forming precise patterns during semiconductor fabrication. Otoguro is associated with 2 patents and is based in Kawasaki, Japan.

Latest Patents

Method of Manufacturing Semiconductor Device and Method of Forming Pattern. This invention describes forming a patterning film on a substrate from three layers: an innermost layer, an inner layer, and a surface layer. It specifies minimum extinction coefficients for the innermost and inner layers, supporting the formation of patterns used in semiconductor device manufacturing.

Multi-Layered Resist Structure and Manufacturing Method of Semiconductor Device. This invention describes a multilayer resist process that transfers a pattern through upper, intermediate, and lower resist layers before etching the target layer. The organic intermediate layer contains no Si—O bond, and the upper resist layer is made from alicyclic resin. The process is designed to help suppress deformation of the upper resist pattern during semiconductor manufacturing.

Career Highlights

Otoguro’s patent portfolio focuses on lithographic pattern formation and resist-layer engineering. These technologies address challenges in transferring patterns accurately through multiple layers during semiconductor fabrication.

Collaborations

Otoguro’s listed coworkers include Satoshi Takechi and Takatoshi Deguchi. His work is associated with Fujitsu Corporation.

Conclusion

Akihiko Otoguro’s inventions contribute to semiconductor manufacturing by developing multilayer patterning methods intended to improve pattern transfer and reduce resist deformation.