Fuji, Japan

Akihiko Ideda

This inventor holds 1 USPTO granted patent. Top assignee: Asahi Kasei Kogyo Kabushiki Kaisha. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akihiko Ideda. Retrieved from https://idiyas.com/inventor/akihiko-ideda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: Akihiko Ideda: Innovator in Photopolymerizable Laminate Technology

Introduction

Akihiko Ideda is a notable inventor based in Fuji, Japan. He has made significant contributions to the field of photopolymerizable materials, particularly through his innovative patent.

Latest Patents

Ideda holds a patent for a photopolymerizable laminate. This laminate comprises a photopolymerizable layer and a support layer. The photopolymerizable layer contains a binder made of a vinyl polymer or a vinyl copolymer, a monomeric component with specific weight percentages, and a photopolymerization initiator. His invention is designed to enhance the properties and applications of photopolymerizable materials.

Career Highlights

Ideda is associated with Asahi Kasei Kogyo Kabushiki Kaisha, a leading company in the chemical industry. His work has contributed to advancements in material science and technology.

Collaborations

He has collaborated with notable coworkers, including Hideo Ai and Jiro Sato, to further develop innovative solutions in his field.

Conclusion

Akihiko Ideda's contributions to photopolymerizable laminate technology exemplify the impact of innovation in material science. His work continues to influence advancements in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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