Tokyo, Japan

Akifumi Tamura

This inventor holds 1 USPTO granted patent and 2 published patent applications and 2 EPO patents. Top assignee: Showa Denko K.k.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akifumi Tamura. Retrieved from https://idiyas.com/inventor/akifumi-tamura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Akifumi Tamura: Innovator in Adhesive Technology

Introduction

Akifumi Tamura is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of adhesive technology, particularly through his innovative patent.

Latest Patents

Tamura holds a patent for a radical-curable adhesive composition. This composition includes a rubber that possesses one or more (meth)acryloyl groups within a single molecular chain. Additionally, it features a polymerizable monomer that contains both an epoxy group and a (meth)acryloyloxy group, along with a radical polymerization initiator. The rubber is preferably a polymer of a monomer that includes at least acrylonitrile.

Career Highlights

Tamura is currently employed at Showa Denko K.K., where he continues to develop and refine adhesive technologies. His work has been instrumental in advancing the capabilities of adhesive compositions in various applications.

Collaborations

He has collaborated with notable coworkers, including Ryohei Ito and Tsunehiko Nishimura, contributing to the innovative environment at Showa Denko K.K.

Conclusion

Akifumi Tamura's contributions to adhesive technology through his patent demonstrate his expertise and commitment to innovation in the field. His work continues to influence the development of advanced adhesive solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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