Espoo, Finland

Aki Tuomisalo

This inventor holds 2 USPTO granted patents and 4 published patent applications and 3 EPO patents. Top assignee: Metso Sweden Ab. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Aki Tuomisalo. Retrieved from https://idiyas.com/inventor/aki-tuomisalo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Aki Tuomisalo: Innovator in Slurry Pump Technology

Introduction

Aki Tuomisalo is a notable inventor based in Espoo, Finland. He has made significant contributions to the field of slurry pump technology. His innovative approach has led to the development of a unique wear element that enhances the efficiency and durability of slurry pumps.

Latest Patents

Aki Tuomisalo holds 1 patent for his invention titled "Wear element for a slurry pump." This patent describes a wear element designed to produce a magnetic field that attracts magnetic particles in a slurry processed by the pump. The wear element includes a magnet that generates a protective wear layer on its surface. This innovative design allows for improved performance and longevity of the slurry pump.

Career Highlights

Aki Tuomisalo is associated with Metso Sweden Ab, where he applies his expertise in developing advanced slurry pump solutions. His work focuses on enhancing the functionality and reliability of pumping systems used in various industrial applications.

Conclusion

Aki Tuomisalo's contributions to slurry pump technology exemplify the impact of innovative thinking in engineering. His patented invention not only improves the efficiency of slurry pumps but also showcases the importance of integrating magnetic technology in industrial applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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