Tokyo, Japan

Akane Nariyuki

This inventor holds 1 USPTO granted patent. Top assignee: Nikki-Universal Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akane Nariyuki. Retrieved from https://idiyas.com/inventor/akane-nariyuki-xm2dkn0s

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Akane Nariyuki: Innovator in Air Filtration Technology

Introduction

Akane Nariyuki is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of air filtration technology. Her innovative approach has led to the development of a unique filtering material that enhances air quality.

Latest Patents

Nariyuki holds a patent for a filtering material for air filters and a method for manufacturing this filtering material. The invention includes a base material that supports an enzyme-containing antibacterial material, an inorganic anti-allergenic material, and a fungal inhibitor. This combination aims to improve the effectiveness of air filters in various environments.

Career Highlights

Nariyuki is currently employed at Nikki-Universal Co., Ltd., where she continues to advance her research and development efforts. Her work has garnered attention for its potential impact on public health and environmental sustainability.

Collaborations

Throughout her career, Nariyuki has collaborated with notable colleagues, including Mitsuhiro Ishida and Toshiya Nashida. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Akane Nariyuki is a trailblazer in the field of air filtration technology, with a focus on creating effective solutions for cleaner air. Her contributions are paving the way for advancements in public health and environmental protection.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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