Company Filing History:
Years Active: 2025
Title: Akane Kumayama: Innovator in Polishing Composition Technology
Introduction
Akane Kumayama is a notable inventor based in Kiyosu, Japan. She has made significant contributions to the field of semiconductor manufacturing through her innovative work in polishing compositions. Her expertise and dedication have led to advancements that improve the efficiency of semiconductor substrate production.
Latest Patents
Kumayama holds a patent for a polishing composition, polishing method, and method of manufacturing semiconductor substrate. This invention aims to enhance the ratio of polishing speed between SiOC and SiN. The polishing composition includes abrasive grains with zirconia particles, a selection ratio improver made of specific salts, and a pH adjusting agent that maintains a pH level between 3.0 and 7.0. This innovative approach ensures that the zeta potential of the abrasive grain remains positive, optimizing the polishing process.
Career Highlights
Akane Kumayama is currently employed at Fujimi Incorporated, where she continues to develop and refine her inventions. Her work has been instrumental in advancing polishing technologies that are crucial for semiconductor manufacturing. With her patent, she has established herself as a key player in this specialized field.
Collaborations
Kumayama collaborates with her coworker, Masaki Tada, who also contributes to the innovative efforts at Fujimi Incorporated. Their teamwork exemplifies the collaborative spirit that drives technological advancements in their industry.
Conclusion
Akane Kumayama's contributions to polishing composition technology highlight her role as an influential inventor in the semiconductor field. Her innovative patent reflects her commitment to improving manufacturing processes, making her a valuable asset to Fujimi Incorporated and the broader technological community.