Saint-Ismier, France

Aime Perrin

This inventor holds 8 USPTO granted patents. Top assignees: Commissariat a L'energie Atomique Et Aux Energies Alternatives, Etat Francais Represente Par Le Delegue General Pour L'armement. Active years: 1988-1999.


% Patents Active = 100.0

Average Co-Inventor Count = 2.2

ph-index = 4

Forward Citations = 98(Granted Patents)


Location History:

  • Saint Ismier, FR (1988 - 1989)
  • St Ismier, FR (1998)
  • St. Ismier, FR (1991 - 1999)

Company Filing History:


Years Active: 1988-1999

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8 patents (USPTO):Explore Patents

Title: Aime Perrin: Innovator in Microelectronics

Introduction: Aime Perrin is a distinguished inventor based in St. Ismier, France, known for his significant contributions to the field of microelectronics. With a total of eight patents to his name, Perrin has made notable advancements in the manufacturing processes for flat viewing screens.

Latest Patents: One of his latest patents is a method of manufacturing spacers for flat viewing screens. This invention relates to a collective manufacturing process for spacers that control high voltage and are divided into picture elements or pixels. The method includes a self-alignment process that is applicable in microelectronics, aimed at achieving alignment of groups of holes within a stacked structure.

Career Highlights: Throughout his career, Aime Perrin has worked with prominent organizations, including the Commissariat à l'Énergie Atomique and the French State represented by the General Delegate for Armament. His work has been pivotal in enhancing the efficiency and effectiveness of microelectronic devices.

Collaborations: Perrin has collaborated with notable colleagues such as Jean-Frederic Clerc and Jean-Claude Deutsch. These partnerships have contributed to the innovative projects he has undertaken in the realm of microelectronics.

Conclusion: Aime Perrin's contributions to the field of microelectronics through his patents and collaborations highlight his role as a key innovator. His work continues to influence the development

Profile summary based on public USPTO records.
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