Toyama, Japan

Aiko Umeda

This inventor holds 1 USPTO granted patent. Top assignee: Kokusai Electric Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Aiko Umeda. Retrieved from https://idiyas.com/inventor/aiko-umeda-7ov2ucil

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Aiko Umeda: Innovator in Semiconductor Manufacturing

Introduction

Aiko Umeda is a prominent inventor based in Toyama, Japan. She has made significant contributions to the field of semiconductor manufacturing. Her innovative techniques have paved the way for advancements in substrate processing methods.

Latest Patents

Aiko Umeda holds a patent for a "Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus and non-transitory computer-readable recording medium." This patent introduces a technique capable of stably forming a film on a substrate, regardless of machine differences or processing conditions. The method includes several steps, such as setting correction coefficients for microwave output levels, storing correction tables, and processing substrates by supplying microwaves into a process chamber with corrected output levels.

Career Highlights

Aiko Umeda is currently employed at Kokusai Electric Corporation, where she continues to develop innovative solutions in semiconductor technology. Her work has been instrumental in enhancing the efficiency and reliability of semiconductor manufacturing processes.

Collaborations

Aiko collaborates with notable colleagues, including Tsukasa Yashima and Yoshihiko Nakagawa. Their combined expertise contributes to the advancement of semiconductor technologies.

Conclusion

Aiko Umeda's contributions to semiconductor manufacturing highlight her role as a leading inventor in the industry. Her innovative methods and collaborative efforts continue to drive progress in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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