Aiko Furuichi

Title: Aiko Furuichi - Innovator in Photoelectric Conversion Technology

Introduction

Aiko Furuichi is an inventive mind based in Sagamihara-shi, Japan. She has made significant contributions to the field of photoelectric conversion technology. Although she currently holds no granted patents, her innovative ideas are reflected in her patent applications.

Latest Patent Applications

One of her notable patent applications is titled "PHOTOELECTRIC CONVERTER AND IMAGING SYSTEM INCLUDING THE SAME." This application describes a photoelectric converter that includes a substrate and photoelectric converting elements formed within it. Each element has a light-receiving surface and is equipped with an antireflection film positioned above at least part of the light-receiving surface. The design also incorporates an element isolation region that includes an insulator, along with a plurality of transistors, including read transistors that are configured to read electric charges from the photoelectric converting elements. Additionally, an interlayer insulating film is arranged above the photoelectric conversion elements and the read transistors, with contacts that are electrically connected to the active regions of the transistors. The antireflection film serves a dual purpose, acting as an etch stop film during the etching of the interlayer insulating film.

Conclusion

Aiko Furuichi is a promising inventor in the realm of photoelectric technology, showcasing her innovative spirit through her patent applications. Her work has the potential to influence future advancements in imaging systems.