Company Filing History:
Years Active: 2003
Title: Aik Hon Goh: Innovator in Semiconductor Processing
Introduction
Aik Hon Goh is a notable inventor based in Singapore, recognized for his contributions to semiconductor manufacturing. He has developed innovative processes that enhance the efficiency and effectiveness of semiconductor fabrication.
Latest Patents
Aik Hon Goh holds a patent for an "Enhanced passivation scheme for post metal etch clean process." This invention introduces a two-step passivation procedure designed to remove chlorine from polymer layers formed on the sides of metal structures. The first step is performed at a low substrate temperature of 100-140°C and low RF power, utilizing a 2 to 1 ratio of oxygen to water. This step effectively removes corrosion-causing chlorine from the polymer layers on the sides of defined metal structures. The second step is conducted at a higher substrate temperature of 200-250°C, using water only, to remove chlorine from polymer layers on the sides of metal structures located at the center of the semiconductor substrate. This innovative process allows for the removal of the masking photoresist shape and polymer layers without chlorine.
Career Highlights
Aik Hon Goh is currently employed at Chartered Semiconductor Manufacturing Ltd, where he applies his expertise in semiconductor processing. His work has significantly contributed to advancements in the field, particularly in improving the reliability and performance of semiconductor devices.
Collaborations
Aik Hon Goh has collaborated with notable colleagues, including Xin Wei Zhang and Carol Goh, to further enhance the development of semiconductor technologies.
Conclusion
Aik Hon Goh's innovative contributions to semiconductor processing, particularly through his patented passivation scheme, highlight his role as a key inventor in the industry. His work continues to influence advancements in semiconductor manufacturing, showcasing the importance of innovation in technology.