Yokkaichi, Japan

Ai Omodaka

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Kabushiki Kaisha Toshiba. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ai Omodaka. Retrieved from https://idiyas.com/inventor/ai-omodaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Ai Omodaka

Introduction

Ai Omodaka is a talented inventor based in Yokkaichi, Japan. She has made significant contributions to the field of simulation technology. With a focus on creating advanced simulation apparatuses, her work has garnered attention in the industry.

Latest Patents

Ai Omodaka holds a patent for a "Simulation apparatus, simulation method and non-transitory computer readable recording medium." This innovative patent describes a simulation apparatus that includes a two-dimensional section dividing processing unit, a two-dimensional simulator, a one-dimensional combining processing unit, and a three-dimensional shape combining processing unit. The apparatus is designed to divide a three-dimensional shape into two-dimensional sections, run simulations, and create three-dimensional structures based on the acquired data.

Career Highlights

Throughout her career, Ai Omodaka has been associated with Kabushiki Kaisha Toshiba, where she has applied her expertise in simulation technology. Her work has contributed to advancements in the field, showcasing her skills as an inventor and innovator.

Collaborations

Ai has collaborated with notable colleagues, including Yoshiyuki Shioyama and Kenji Kawabata. These partnerships have allowed her to enhance her projects and drive innovation within her team.

Conclusion

Ai Omodaka is a remarkable inventor whose work in simulation technology continues to impact the industry. Her patent and collaborations reflect her dedication

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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