Anpachi-gun, Japan

Ai Koganemaru

This inventor holds 1 USPTO granted patent and 1 published patent application and 2 EPO patents. Top assignee: Teijin Dupont Films Japan Limited. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ai Koganemaru. Retrieved from https://idiyas.com/inventor/ai-koganemaru-eea0j62u

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Ai Koganemaru: Innovator in Conductive Film Technology

Introduction

Ai Koganemaru is a notable inventor based in Anpachi-gun, Japan. She has made significant contributions to the field of materials science, particularly in the development of conductive films. Her innovative work has led to the creation of a unique product that combines various desirable properties.

Latest Patents

Koganemaru holds a patent for a conductive film that excels in moist heat resistance, conductivity, transparency, and coating film strength. This conductive film comprises a base film and a coating layer formed on the base film by curing a composition. The advancements in her patent have the potential to impact various industries that rely on high-performance materials.

Career Highlights

Ai Koganemaru is currently employed at Teijin Dupont Films Japan Limited, where she continues to push the boundaries of material innovation. Her work at this esteemed company has allowed her to collaborate with other talented professionals in the field.

Collaborations

One of her notable coworkers is Masato Asai, who has worked alongside Koganemaru on various projects. Their combined expertise contributes to the innovative environment at Teijin Dupont Films Japan Limited.

Conclusion

Ai Koganemaru's contributions to the field of conductive films demonstrate her commitment to innovation and excellence. Her work not only enhances material properties but also paves the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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