Owariasahi, Japan

Ai Inoue

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Ai Inoue - Innovator in Semiconductor Technology

Introduction

Ai Inoue is a talented inventor based in Yokohama-shi, Japan. She has made significant contributions to the field of semiconductor technology. Although she currently holds no granted patents, her innovative ideas are reflected in her latest patent applications.

Latest Patent Applications

Ai Inoue's recent patent applications include a "SEMICONDUCTOR DEVICE AND DESIGN APPARATUS FOR SEMICONDUCTOR DEVICE." This application describes a semiconductor device that features a substrate made of silicon. The device includes a first element that extends in the thickness direction of the substrate, with specific design considerations regarding the end faces of the element.

Another notable application is for a "PROCESS CONVERSION DIFFERENCE PREDICTION DEVICE, PROCESS CONVERSION DIFFERENCE PREDICTION METHOD, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM CONTAINING A PROCESS CONVERSION DIFFERENCE PREDICTION PROGRAM." This invention aims to predict process conversion differences in a processed pattern based on simulation results of the resist pattern's cross-sectional shape.

Conclusion

Ai Inoue is an emerging inventor whose work in semiconductor technology shows great promise. Her latest patent applications highlight her innovative approach to solving complex problems in the field.

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