This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Lg Chem, Ltd. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: The Innovative Contributions of Ah-Ram Kim
Introduction
Ah-Ram Kim is a notable inventor based in Pyeongtaek-si, South Korea. He has made significant contributions to the field of chemical mechanical polishing through his innovative designs and patents. His work is particularly recognized for enhancing the efficiency and effectiveness of polishing processes in various applications.
Latest Patents
Ah-Ram Kim holds a patent for a "Polishing pad for chemical mechanical polishing apparatus." This invention relates to a polishing pad characterized by a unique shape featuring three or more semi-oval or semicircular curves that connect two valleys on the plane. The pad includes two or more modified patterns formed to a determined thickness, allowing for improved slurry dispersion during the polishing process. This design enhances polishing uniformity and optimizes the residence time of the slurry, ultimately increasing the polishing rate.
Career Highlights
Ah-Ram Kim is currently employed at LG Chem, Ltd., a leading company in the chemical industry. His role involves developing innovative solutions that contribute to the advancement of chemical mechanical polishing technologies. His expertise and dedication have positioned him as a valuable asset to his team and the industry.
Collaborations
Ah-Ram Kim has collaborated with notable colleagues, including Byeong-In Ahn and Dong-Mok Shin. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Ah-Ram Kim's contributions to the field of chemical mechanical polishing exemplify the impact of innovative thinking in technology. His patent and collaborative efforts highlight the importance of continuous improvement in industrial processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
