This inventor holds 1 USPTO granted patent. Top assignees: Basque Center for Macromolecular Design and Engine, University of the Basque Country. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Adrián Badía: Innovator in Pressure-Sensitive Adhesives
Introduction
Adrián Badía is a notable inventor based in Leioa, Spain. He has made significant contributions to the field of polymeric compositions, particularly in the development of pressure-sensitive adhesives. His innovative approach has led to advancements that are particularly useful in various applications.
Latest Patents
Adrián Badía holds a patent for a "Method for producing a removable pressure-sensitive adhesive (PSA) and pressure-sensitive adhesive thus produced." This invention focuses on a method for producing polymeric compositions, specifically dispersions such as emulsions or latices. These compositions are designed to function effectively as adhesives, especially those that are removable under neutral or basic (alkaline) conditions. The patent highlights the versatility and utility of the polymeric compositions in various applications.
Career Highlights
Throughout his career, Adrián has worked with esteemed institutions such as the University of the Basque Country and the Basque Center for Macromolecular Design and Engineering. His work in these organizations has allowed him to explore and develop innovative solutions in the field of adhesives.
Collaborations
Adrián has collaborated with notable colleagues, including José Ramón Leiza and María Jesús Barandiaran. These partnerships have contributed to the advancement of research and development in adhesive technologies.
Conclusion
Adrián Badía's contributions to the field of pressure-sensitive adhesives demonstrate his innovative spirit and commitment to advancing polymeric compositions. His work continues to influence the industry and pave the way for future developments.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile