Chaam, Netherlands

Adrianus Alphonsus Maria Kusters


 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: The Innovations of Adrianus Alphonsus Maria Kusters

Introduction: Adrianus Alphonsus Maria Kusters, an inventive mind hailing from Chaam, Netherlands, has made significant contributions in the field of materials science. His innovative work primarily focuses on specialized copolymers that enhance material performance and durability.

Latest Patents: Kusters holds a patent for "Polyestercarbonate copolymers with high scratch resistance." This breakthrough technology involves polyestercarbonate copolymers that comprise a carbonate unit of Formula (I), an ITR ester unit of Formula (V), and an optional different carbonate unit of Formula (VI). The resulting copolymers exhibit exceptional scratch resistance, excellent flow properties, and remarkable weatherability, making them ideal candidates for various commercial applications.

Career Highlights: Adrianus is currently associated with Sabic Global Technologies B.V., a leader in the development of innovative materials. His experience and expertise enable him to contribute extensively to the advancement of polymer technology within the company.

Collaborations: Throughout his career, Kusters has collaborated with notable colleagues such as Hans de Brouwer and Robert Dirk van Grampel. These partnerships have fostered a creative environment that encourages the exchange of ideas and drives forward-thinking innovations in their collective research.

Conclusion: Adrianus Alphonsus Maria Kusters exemplifies the role of an innovator in the modern materials landscape. His patented work on polyestercarbonate copolymers not only showcases his technical skill but also highlights the importance of collaboration in achieving groundbreaking advancements. As the industry continues to evolve, Kusters' contributions will undoubtedly play a pivotal role in shaping the future of polymer applications.

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