Newburyport, MA, United States of America

Aditya Agarwal

This inventor holds 1 USPTO granted patent. Top assignee: Axcelis Technologies, Inc.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Aditya Agarwal. Retrieved from https://idiyas.com/inventor/aditya-agarwal-w3ngziry

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Aditya Agarwal: Innovator in Ion Implantation Technology

Introduction

Aditya Agarwal is a notable inventor based in Newburyport, MA (US). He has made significant contributions to the field of ion implantation technology. His innovative approach has led to the development of a unique patent that enhances the precision of ion beam processing.

Latest Patents

Aditya Agarwal holds a patent for "Controlled Dose Ion Implantation." This invention describes an ion implanter designed to create a ribbon or ribbon-like beam. The device features a scanning mechanism that produces a side-to-side scanning of ions emitted by a source. This technology allows for a thin beam of ions to be directed into an implantation chamber. A workpiece support positions the workpiece within this chamber, while a drive mechanism moves the support up and down through the thin ribbon beam of ions. This process is perpendicular to the plane of the ribbon, enabling controlled beam processing of the workpiece. The control system includes outputs that limit the extent of both the side-to-side scanning and the up-and-down movement of the workpiece. This ensures that ion processing is confined to a specified region of the workpiece, allowing for precise control over the ion beam's impact.

Career Highlights

Aditya Agarwal is currently employed at Axcelis Technologies, Inc., where he continues to innovate in the field of ion implantation. His work has been instrumental in advancing the capabilities of ion implanters, making them more efficient and effective for various applications.

Collaborations

Throughout his career, Aditya has collaborated with esteemed colleagues such as Robert D. Rathmell and David Hoglund. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Aditya Agarwal's contributions to ion implantation technology exemplify the spirit of innovation. His patent for Controlled Dose Ion Implantation showcases his commitment to advancing the field. Through his work at Axcelis Technologies, he continues to push the boundaries of what is possible in ion beam processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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