Kelkheim, Germany

Adam Urschel

This inventor holds 1 USPTO granted patent. Top assignee: Hoechst Aktiengesellschaft. Active years: 1987.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: Adam Urschel: Innovator in Chemical Processes

Introduction

Adam Urschel is a notable inventor based in Kelkheim, Germany. He has made significant contributions to the field of chemical processes, particularly in the removal of residual sulfuric acid from reaction mixtures. His innovative approach has implications for various industrial applications.

Latest Patents

Urschel holds a patent for a process aimed at the removal of residual sulfuric acid from a reaction mixture. This process involves the reaction of paraffin with sulfur dioxide, oxygen, and water under UV light irradiation. The method includes degassing the mixture at elevated temperatures and concentrating the product. By adding an alkali metal carbonate, peroxide, hydroxide, sulfate, or sulfonate, the residual sulfuric acid is converted into an alkali metal bisulfate. This patent showcases his expertise in chemical engineering and innovation.

Career Highlights

Adam Urschel is associated with Hoechst Aktiengesellschaft, a prominent company in the chemical industry. His work there has allowed him to develop and refine his patented processes, contributing to advancements in chemical manufacturing and safety.

Collaborations

Urschel has collaborated with Ernst Horoldt, a fellow professional in the field. Their partnership has likely fostered innovation and the exchange of ideas, enhancing their contributions to chemical processes.

Conclusion

Adam Urschel's work exemplifies the spirit of innovation in the chemical industry. His patent for the removal of residual sulfuric acid demonstrates his commitment to improving industrial processes. His contributions continue to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
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