Company Filing History:
Years Active: 2024
Title: Adam Seeger - Innovator in Lithography Mask Measurement Tools
Introduction
Adam Seeger is a prominent inventor based in Palo Alto, CA. He has made significant contributions to the field of lithography through his innovative patent. His work focuses on enhancing the precision of measurement tools used in the production of lithography masks.
Latest Patents
Adam Seeger holds a patent for a "Measurement tool and method for lithography masks." This patent describes a EUV mask measurement tool that includes a high power extreme ultraviolet (EUV) light beam source assembly, a detector assembly with a projection optics system and a CCD camera, and a stage for supporting a patterned mask. The tool is designed to determine a site-specific best focus plane for each of the predetermined test sites on the patterned mask. The method involves a continuous scanning process that provides a continuous image output from the test site. He has 1 patent to his name.
Career Highlights
Adam Seeger is currently employed at Intel Corporation, where he continues to develop innovative technologies in the field of lithography. His expertise and contributions have positioned him as a valuable asset to the company.
Collaborations
Throughout his career, Adam has collaborated with notable colleagues, including Yoshihiro Tezuka and Ping Qu. These collaborations have further enhanced the development of advanced measurement tools in the industry.
Conclusion
Adam Seeger is a key figure in the innovation of lithography mask measurement tools, with a focus on precision and efficiency. His contributions to the field are significant and continue to impact the industry positively.