Bettendorf, IA, United States of America

Adam J Kolman

This inventor holds 1 USPTO granted patent. Top assignee: Deere & Company. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Adam J Kolman. Retrieved from https://idiyas.com/inventor/adam-j-kolman

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Adam J. Kolman and Worksite Risk-Reduction Technology.

Introduction

Adam J. Kolman is an inventor based in Bettendorf, Iowa, and is associated with Deere & Company. His patent work addresses risk reduction for work machines operating at worksites.

Latest Patents

Kolman is credited with 1 patent: “Risk Reduction System and Method for One or More Work Machines at a Worksite.” The invention describes a processor that receives a machine’s location and alert-event information from monitoring systems. It classifies alerts using machine-learning algorithms or predefined rules, assigns each classified event a unique indicator, and generates a count-based report for display through a user interface. The system is designed to help organize worksite alerts and support risk-reduction efforts.

Career Highlights

Kolman’s listed patent reflects work on applying data processing and event classification to the operation of work machines. His association with Deere & Company connects this invention to the company’s work in agricultural and construction equipment.

Collaborations

The provided information lists Amy K. Jones and Anthony Herrera as Kolman’s coworkers. It does not specify their roles in the patent or whether they collaborated on the invention.

Conclusion

Adam J. Kolman’s patent focuses on turning machine location and monitoring alerts into categorized, count-based reports, supporting more structured risk management at worksites.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…