Minneapolis, MN, United States of America

Adam J C Runnoe

This inventor holds 4 USPTO granted patents. Top assignee: Tennant Company. Active years: 2018-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Adam J C Runnoe. Retrieved from https://idiyas.com/inventor/adam-j-c-runnoe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2018-2021

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4 patents (USPTO):Explore Patents

Title: The Innovations of Adam J C Runnoe

Introduction

Adam J C Runnoe is a notable inventor based in Minneapolis, MN (US). He has made significant contributions to the field of surface maintenance technology. With a total of 4 patents to his name, Runnoe has developed innovative solutions that enhance cleaning efficiency and effectiveness.

Latest Patents

Runnoe's latest patents include a "Surface maintenance machine with a quick alignment mechanism for a cleaning tool." This invention features a cleaning head assembly that allows for easy alignment of the cleaning tool with the driver, ensuring optimal performance. Another notable patent is the "Surface maintenance machine with skirting to allow particulate pickup." This design incorporates a rotary broom and a vacuum system that work together to efficiently collect debris, preventing accumulation on the machine's sides.

Career Highlights

Runnoe is currently employed at Tennant Company, a leader in the cleaning equipment industry. His work focuses on developing advanced surface maintenance machines that meet the needs of various cleaning applications. His innovative designs have contributed to the company's reputation for quality and efficiency.

Collaborations

Throughout his career, Runnoe has collaborated with talented individuals such as Warren L Larson and Kevin R Williams. These partnerships have fostered a creative environment that encourages the development of cutting-edge cleaning technologies.

Conclusion

Adam J C Runnoe's contributions to surface maintenance technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of cleaning challenges and a dedication to providing effective solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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