Düsseldorf, Germany

Adam Gurtler

This inventor holds 2 USPTO granted patents. Top assignee: Stora Feldmuhle Ag. Active years: 1998-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Adam Gurtler. Retrieved from https://idiyas.com/inventor/adam-gurtler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 1998-1999

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2 patents (USPTO):Explore Patents

Title: Adam Gurtler: Innovator in Web Printing Technology

Introduction

Adam Gurtler is a notable inventor based in Düsseldorf, Germany. He has made significant contributions to the field of web printing technology. With a total of 2 patents to his name, Gurtler has demonstrated his expertise and innovative spirit in the industry.

Latest Patents

Gurtler's latest patents include "Web printing paper coated on both sides and process for its manufacture" and "Web printing paper and process for producing it." These inventions showcase his commitment to advancing printing technology and improving the quality of printed materials.

Career Highlights

Adam Gurtler is currently employed at Stora Feldmühle AG, a company known for its expertise in paper production. His work at this organization has allowed him to further develop his innovative ideas and contribute to the company's success in the industry.

Collaborations

Gurtler has collaborated with notable colleagues such as Dieter Horand and Bernd Pelech. These partnerships have likely enriched his work and fostered a collaborative environment for innovation.

Conclusion

In summary, Adam Gurtler is a distinguished inventor whose contributions to web printing technology have made a significant impact. His patents and work at Stora Feldmühle AG reflect his dedication to innovation in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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