Santa Clara, CA, United States of America

Abulaiti Hairisha

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Abulaiti Hairisha. Retrieved from https://idiyas.com/inventor/abulaiti-hairisha

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 13.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Abulaiti Hairisha: Innovator in Selective Metal Removal Technologies

Introduction

Abulaiti Hairisha is a notable inventor based in Santa Clara, California, recognized for his innovative contributions in the field of semiconductor processing. With a strong focus on the selective removal of metals, Hairisha has made a significant impact in the advanced technology landscape.

Latest Patents

Abulaiti Hairisha holds one patent titled "One Chamber Multi-Station Selective Metal Removal." This patent represents a sophisticated method of selective metal removal through gradient oxidation. The process involves multiple steps, including placing a wafer with a semiconductor structure into various processing stations within a chamber. Each station plays a crucial role in performing different processes, such as reduction, gradient oxidation, and gradient etching, ensuring effective gap-fill while maintaining precision in semiconductor manufacturing.

Career Highlights

Currently, Abulaiti Hairisha is associated with Applied Materials, Inc., a leading company in the semiconductor equipment industry. His role at Applied Materials has allowed him to leverage his expertise to drive advancements in semiconductor processing technologies. His work focuses on enhancing the efficiency and effectiveness of manufacturing processes critical to the electronics sector.

Collaborations

Abulaiti collaborates with talented professionals in his field, including his coworker, Shiyu Yue. Together, they contribute to the innovative projects at Applied Materials, aiming to challenge the limits of traditional semiconductor processing techniques and usher in new advancements that can significantly enhance production capabilities.

Conclusion

Abulaiti Hairisha's commitment to innovation in selective metal removal technologies exemplifies the impact inventors can have on the semiconductor industry. His patent and ongoing collaborations reflect a dedication to enhancing manufacturing processes and pushing the boundaries of what's possible in technology. As the industry evolves, contributions from inventors like Hairisha will be essential in shaping the future of semiconductor advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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