Webster, NY, United States of America

Abukar H Wehelie


Average Co-Inventor Count = 4.7

ph-index = 4

Forward Citations = 205(Granted Patents)


Company Filing History:


Years Active: 2000-2002

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4 patents (USPTO):Explore Patents

Title: Abukar H Wehelie: Innovator in Charge Transport Layer Technology

Introduction

Abukar H Wehelie is a notable inventor based in Webster, NY (US). He has made significant contributions to the field of imaging technology, particularly in the development of charge transport layers for photoreceptors. With a total of 4 patents to his name, Wehelie's work has had a substantial impact on print quality and efficiency.

Latest Patents

One of his latest patents is titled "Wear resistant charge transport layer with enhanced toner transfer efficiency, containing polytetrafluoroethylene particles." This innovation involves a charge transport layer material for a photoreceptor that includes a polycarbonate polymer binder, charge transport material, and polytetrafluoroethylene particle aggregates. The resulting material is designed to exhibit excellent wear resistance and superior print quality. Another significant patent is focused on "Low surface energy photoreceptors," which incorporates hydrophobic silica particles into the imaging member's external layer. This advancement enhances the overall performance of imaging devices.

Career Highlights

Abukar H Wehelie is currently employed at Xerox Corporation, where he continues to push the boundaries of imaging technology. His work has been instrumental in improving the efficiency and quality of printing processes, making him a valuable asset to the company.

Collaborations

Throughout his career, Wehelie has collaborated with esteemed colleagues such as John S Chambers and Huoy-Jen Yuh. These partnerships have fostered innovation and have contributed to the successful development of his patented technologies.

Conclusion

Abukar H Wehelie's contributions to the field of imaging technology through his innovative patents have significantly advanced the quality and efficiency of photoreceptors. His work continues to influence the industry and showcases the importance of innovation in technology.

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